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    基于经验复用与思维链剪枝的大模型运放尺寸优化

    LLM-Based Amp Sizing Optimization with Experience Reuse and CoT Pruning

    • 摘要: 模拟电路自动化设计中的放大器晶体管尺寸优化具有高维搜索空间大、参数敏感性强和工业工艺约束严格等挑战。针对现有基于大模型方法在迭代仿真闭环中效率低、易陷入反复搜索的问题,提出了2项核心技术:其一,经验复用搜索增强机制,将成功推理过程中产生的领域知识与调整经验结构化存储于经验库中,实现跨任务知识复用,显著减少重复检索与无效探索;其二,基于领域知识的思维链显式剪枝,将领域知识转化为细粒度推理约束,显式指导大模型思维链生成过程,对错误推理路径进行有效剪枝,加快收敛并提升稳定性。最后,在多种运放结构及5个工业级工艺节点上进行了充分实验,验证了所提方法的有效性,结果显示在显著降低仿真次数的同时实现更优优化性能和工业可用性。

       

      Abstract: Transistor sizing optimization for analog amplifiers is challenging in automated analog-circuit design because of its large, high-dimensional design space, strong parameter sensitivity, and stringent industrial process constraints. Existing large language model (LLM)-based methods often operate inefficiently in iterative simulation-in-the-loop optimization and may repeatedly explore similar or ineffective regions. To overcome these limitations, this work proposes two complementary techniques. First, an experience-reuse-enhanced search mechanism structures and stores domain knowledge and parameter-adjustment experience generated during successful reasoning in an experience repository. This repository supports cross-task knowledge reuse, reducing redundant retrieval and unproductive exploration. Second, a domain-knowledge-guided explicit chain-of-thought pruning mechanism converts domain knowledge into fine-grained constraints that guide LLM reasoning-chain generation and prune erroneous paths. This mechanism accelerates convergence and improves optimization stability. Comprehensive experiments are performed on multiple operational-amplifier topologies and five industrial process nodes. The results show that the proposed method substantially reduces the number of circuit simulations while delivering superior optimization performance relative to existing LLM-based approaches. These results indicate that the method improves search efficiency without sacrificing solution quality in practical transistor-level optimization workflows. Its effectiveness across diverse amplifier structures and technology nodes further demonstrates its robustness and industrial applicability. The proposed framework therefore offers an efficient, knowledge-aware solution for LLM-driven transistor sizing optimization under realistic process constraints.

       

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